Microlithographic lens design pdf

Cmos device fabrication and the evolution of optical. After the design has been fabricated, there may be some additional steps necessary for precision applications. Design examples of projection lenses for iline exposure lithography and for excimer laser exposure system are presented. Shibazaki, microlithographic lens for duv scanner, in international optical design conference, 2002 osa technical digest series optical society of america, 2002, paper imd4. Microlithography optics part 3 numerical aperture resolution, depth of focus, and depth of field text pp2082 partial coherence sigma or fill factor text pp196202 off axis illumination text pp 96100 text pp235244 mtf and contrast text pp202205 text pp 535 image formation text pp112117. Etymologically, the word tessar is from the greek word tessares, meaning four, which denotes the number of elements in its design. Computeraided alignment is very important for the correction of aberrations due to construction imperfections of microlithographic optical systems. The optical design for microlithographic lenses, proceedings. Introduction the microlithographic community has evolved through many generations of conventional refractive objective solutions for printing and inspection applications.

The illuminator does not require as tight a fabrication precision as the projection lens, but. Fundamental considerations for zoom lens design request pdf. A concept of ultraviolet lithography system and design of its rear. The techniques are based on the linearity of compensators. Even current lenses, comprising more than 20 elements, can be understandable through the analysis. Microlithographic objectives have been developed for deep ultraviolet and vacuum ultraviolet wavelengths used for printing and inspection applications related to microlithographic processes. Japan 175 highnaprojection lens design for exposuretools 483220. Shibazaki, microlithographic lens for duv scanner, in international optical design conference, 2002 osa technical digest series optical society. Choosing the right optical design software is about more than just the software. Ep1686405a1 microlithographic reduction lens with five lens. Spherical aberration is fully corrected by the design itself and ghosting is never a problem. In 2001 he moved to nikon research corporation of america, where he commutes between tucson, arizona and malvern, uk. Design complexity, performance and limitations are compared.

Optical design of ophthalmic lenses introduction we tend to prescribe ophthalmic lenses as though any lens with the right back vertex power will do. Thus, the microlithographic system typically operates in an air atmosphere which is subject to barometric changes and which fills the space between lens 21 and the reticle holder 11 as well as the space between the lens and the wafer stage. The main imaging lens of a stepper is the most demanding application of commercial lens design and fabrication today. Spie 6342, international optical design conference 2006, 63422d 21 july 2006. Brian blandford 2005 7 opic lens design tutorial edu plotting a spot diagram now create a map of the pattern of rays falling on the image. Since the optical design is radially symmetric, only radial distortion is shown. Unlike the first edition, which was more a collection of lens designs for use in larger projects, the 2nd edition of modern lens design is an optical howto. With the optical design process outlined, we can examine how the specifics of the process can vary for different applications. Just like a telescope, photographic objective, or any other optical device, ophthalmic lenses are designed to maximize performance. In this paper, an effective method for compensation selection considering optomechanical constraints is presented. Optical design of the dioptric microlithographic lens was started by modifying a design of projection.

Mouroulis mcdonald geometrical optics and optical design, oxford, 1997 3. A design may be very expensive to manufacture if small variations in the lens. The performance evaluation of these designs are also shown. A microlithographic projection lens is expected to give constant results from one lens to another, anywhere within the field, over the full rayleigh depth of focus, and with a finite variation of exposure dose. Oct 14, 1986 thus, the microlithographic system typically operates in an air atmosphere which is subject to barometric changes and which fills the space between lens 21 and the reticle holder 11 as well as the space between the lens and the wafer stage. Measuring and modeling flare in optical lithography. Micro and nanopatterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The needs of microlithographic lenses are driving advances in lens design software, spherical and aspherical lens manufacturing.

Index inhomogeneities degrade lens performance even if very accurate surface figures are generated. Figure 5c plots the crosssectional intensity profiles obtained from figures 5a and 5b. The thesis titled photographic fisheye lens design for 35mm format cameras prepared by yufeng yan has been submitted in partial fulfillment of requirements for a masters degree at the university of arizona and is deposited in the university library to be made available to borrowers under rules of the library. The homogeneity of the material is measured and compared to passfail criteria. Image formation and camera design university of maryland. Table 2 compared three lens types, with each having a working distance of more than 8 mm. Many of these companies and users chose code v for its advanced algorithms and features related.

But the not all the lens designs are simple lenses, we will look at newer and important lens design forms as well. Commercial imaging systems imaging systems for commercial applications such as camera objectives and projector lenses were one of the earliest application areas that benefited from optical design and analysis software. Requirements and designs of illuminators for microlithography. The basic lens design forms are in here, and we can take a deep look into the development of lens design. This is an ultimate guide of lens design forms, the optical systems that are used in our world.

Even current lenses, comprising more than 20 elements, can be understandable through. Although the lens coatings used today are quite good, they are not perfect. Microlithographic reduction projection catadioptric objective. Lenses, 248nm, 193nm, 157nm, refractive, reflective, chromatic, catadioptric, newtonian.

Moreover, the new aberration functions can be used for the microlithographic lens manufacturing process because they can express each aberration component of. If the object is a plane surface perpendicular to the axis of the optical system, the image of any point on the object must also lie in a plane perpendicular to the axis. Design optimization optimization capabilities are often the most important consideration when choosing optical design software. The needs of microlithographic lenses are driving advances in lens design software, spherical and aspherical lens manufacturing, glass production, and lens metrology. The process of designing lenses is both an art and a science. It was a quick, cheap process and had been used to print british army maps during the peninsula war. Jan 14, 2007 the optical design for microlithographic lenses the optical design for microlithographic lenses ohmura, yasuhiro 20070114 00.

The new functions are orthogonal to each other and expressed by a simple combination of zernike functions of pupil coordinates and zernike functions of field coordinates. Kingslake lens design fundamentals, spie press, 2010 2. Duv and vuv microlithographic objective optical designs. Imaging aberrations, defocus, and zernike polynomials definition of a perfect optical system. Malacara malacara handbook of lens design, dekker, 20 5. Elsevier microelectronic engineering 46 1999 79 cmos device fabrication and the evolution of optical lithographic exposure tools william h arnold asml veldhoven, the netherlands advances in the performance of integrated circuits have long been fuelled by continuing progress in microlithography. Properties of optical systems ii 20170420 herbert gross summer term 2017. Delving deep into the mechanics of lens design, optics legend warren j. Code v optical design software design, optimize and fabricate reliable. Conference camera in a can lens design contest was optimized using.

Figure 5 is the distortion curve for the thistle lens design. The layers include a plurality of structures, and a residual layer having a residual layer thickness rlt that extends from the surface of the substrate to a base of the structures, where the rlt varies across the surface of the substrate according to a predefined pattern. In particular, the requirements for image dimension and position control are an order of magnitude smaller than the features being printed. Although i have taken a great deal of effort to assure accuracy, the user of any of. Create and check lens and component drawings for the fabrication facility. You can see how a new design can evolve around a simple starting point idea or structure. Aberration functions for microlithographic optics springerlink. The lens curves are stronger, but not unreasonable and not difficult to make well. Small increases in bandwidth were achieved when sio 2 and caf 2 are used. Tessar 1902 only 4 elements in 3 groups make up the asymmetrical design. An optical system that transfers the image from the mask to the resist. The new functions can be utilized to express aberrations of a high na and wide field optical system like a microlithographic projection lens. Design and analysis of a high na projection optical system. The new series can be utilized to express aberration distribution of a high na and wide field optical system like a microlithographic projection lens.

The evolution of the microlithographic lens is described based on an analysis of main features of the lenses in each generation. Smith reveals timetested methods for designing topquality lenses. For example, all of the lens designs in the first edition of mld plus many others are included in the lens libraries of the optical design program oslo a product of lambda research corp. This first generation microlithographic lens had a track length, or conjugate distance, of about 600mm. Lens design is, therefore, a strong component of a wellrounded education in optics, and a skill valued by industries employing optical engineers. Topology optimization for optical microlithography with. Mask design for optical microlithographyan inverse. It was invented in 1796 by german author and actor alois senefelder as a cheap method of publishing. Challenges in lens design larger lens required by better resolution. And this is all human based lens design where the fun part, and most important part, comes before we do any computer optimization. The glass model for the design may need to be altered to match measured index data from samples of the real material. High resolution microlithographic reduction lenses are described.

Deviation from the ideal image location is plotted against distance from the center of the field in nanometers. The double expansion of wavefront deformation in zernike polynomials over the pupil and the fieldofview is a promising approach for lens design, testing, and alignment. Principles of atoric lens design darryl meister, abom lens talk sola technical marketing vol. Microlithographic projection lens with a lens arrangement consisting of a first lens group lg1 of positive refractive power, second lens group lg2 of negative power, third lens group lg3 of negative power, fourth lens group lg4 of negative refractive power and fifth lens group lg5 of positive refractive power in which the system diaphragm as lies in the fifth lens group lg5 and. Method for compensation selection of a microlithographic.

The optical design for microlithographic lenses the optical design for microlithographic lenses ohmura, yasuhiro 20070114 00. Fischer tadicgaleb optical system design, mcgraw hill, 2000 4. Understanding lens aberration and influences to lithographic imaging bruce w. Synopsys optical engineers use global synthesis on every applicable design project. Orthogonal aberration functions for microlithographic optics. Us10274823b2 microlithographic fabrication of structures. A comprehensive guide to camera lens design and zeiss. This title is directed primarily towards health care professionals outside of the united states. In 2012, youngworth and betensky 5 proposed a firstorder zoom lens design.

Refractive and catadioptric design solutions using fused silica, calcium fluoride and other crystals are discussed. Aberration functions for microlithographic lens 2006. Click on document introduction to lens design with practical zemax examples pdf. International optical design conference camera in a can lens design contest was optimized using global synthesis. Derived from the older protar and unar designs, tessars simplicity and compactness has made it extremely popular to the point that it is commonly found in todays camera. Data in lens data editor or in extra data editor gradient media are descriped as special surfaces. Nov 22, 2001 a microlithographic reduction projection catadioptric objective comprising in sequence, from an object side to an image side, a field lens group, a catadioptric group comprising one or more negative lenses and a concave mirror generating axial chromatic aberration, a group comprising an odd number of mirrors, and a positive lens group. The printing is from a stone lithographic limestone or a metal plate with a smooth surface. High refractive index fresnel lens on a fiber fabricated by. Lithography, optical design, projection lens, uv, artificial intelligence, starting point. Optical design of the dioptric microlithographic lens was started by modifying a design of projection lens for micro films, which was named ultra micro nikkor.

The diameter of the focal spot measured for 1e2 intensity was found to be 810 nm for the fresnel lens. Request pdf on oct 19, 2016, yang gao and others published design of an ultrashort throw catadioptric projection lens with a freeform mirror find, read and cite all the research you need on. The needs of microlithographic lenses are driving advances in lens. David williamson entered the field of microlithographic lens design in 1985, at the semiconductor equipment division of perkin elmer. Index termsimage synthesis, inverse lithography, inverse problems, mask design, optical microlithography, optical prox imity correction opc, regularization. Selfcompensation for trefoil aberration of symmetric. List the lens data in the text window by clicking on len in the text window header.

The quality of a finished objective for microlithographic applications depends on factors like the design data, the material properties and the manufacturing precision which can be achieved. Further, 50% of these wearers have corrections with over 0. Introduction to lens design with practical zemax examples pdf. Design of an ultrashort throw catadioptric projection. As a result, unwanted reflections, though small in magnitude, are inevitably causing light to bounce around within a lens. The design of lens 21 is shown in greater detail in fig. The criteria for a microlithographic lens system applied to the. Lithography, or printing from soft stone, largely took the place of engraving in the production of english commercial maps after about 1852. In the history of duv deep ultra violet microlithographic lens design, three kinds of leaps have occurred to maintain the progress of technology in the semiconductor industry. The centroid of a ray bundle gives a more accurate prediction of the actual lens distortion. Lenses, 248nm, 193nm, 157nm, refractive, reflective, chromatic, catadioptric, newtonian, obscuration 1. Understanding lens aberration and influences to lithographic. Moreover, the dif ferent lens types that are described are used for applications ranging from 8mm video to 6 3 9cm roll. Modern lens design, 2nd edition book oreilly media.

Another program, lensview by brian caldwell, is a compilation of more than 30,000 lens designs and patents. Microlithographic lenses microlithographic lenses mercado, romeo i matsuyama, tomoyuki 19980921 00. The fraunhofer lens, by contrast, is comacorrected and collimation hardly needs to be done. Buildingworld class microlithographic lens systems. Image focal point, f, is half the distance to the effective center of curvature of the lens object focal point, f, is exactly the same distance on the object side of the lens.

Microlithographic optical design for the extreme ultraviolet 2. Pdf double expansion of wavefront deformation in zernike. The synopsys optical solutions group osg, formerly optical research associates ora, has been providing worldclass support to our code v customers for over 40years. Colloquiumcolloquium optical design for microlithography. All of the information mentioned above is necessary to build stateoftheart microlithographic lens. Lithography from ancient greek, lithos, meaning stone, and. Lens for microlithography hsieh, hungyu 19910301 00. While advancements in the field over the past two centuries have done much to transform it from the former category to the latter, much of the lens design process remains encapsulated in the experience and knowledge of industry. This is accomplished with lenses that contain 20 to 35 optical elements. The compensation results mostly depend on the selection of compensators.